| 中文別名： |
活性氧化鋁;氧化鋁陶瓷;氧化鋁;鋼鋁石;氧化鋁,催化載體,低硅;氧化鋁, REFRACTORY BRUSHABLE PAINT, WATER-BASED;氧化鋁,催化載體,中表面 (LOW SIO{2});氧化鋁瓷球填料;活性氧化鋁,40-60目;活性氧化鋁,60-80目;活性氧化鋁,80-100目;沙格雷酯;氧化鋁;氧化鋁(三氧化二鋁);3-5mm,吸附劑,催化劑及載體;40-60目 GC;60-80目 GC;80-100目 GC;干燥劑;剛玉, 金剛砂;工業(yè)活性氧化鋁標(biāo)準(zhǔn) HG;活性礬土;吸附劑;氧化鋁,催化載體,中表面積 (低二氧化硅);氧化鋁,剛玉,金剛砂;HA金屬鈍化劑;剛玉;中性氧化鋁(100-200);堿性氧化鋁(200-300目);剛玉,金剛砂;氧化鋁 1KG;導(dǎo)熱硅膠墊片硅脂角鋁 無定型氧化鋁粉 |
| 英文別名： |
activated alumina;abramantf36;abramaxf46;abramaxf54;alpha-corundum;aluminiumoxideceramic;aluminiumoxidewafer;Corundum(Al2O3);Alumina,activated;ALUMINUM OXIDE WAFER;corundum balls;CERAMIC BALL;ALUMINUM OXIDE;AluMinuM oxide, catalyst support, interMediate surface area (low SiO{2});T 3927-2007(2014);Corundum;alumina;APA 0.5;Alodur ZWSK 1T180;Alodur ZWSK 1T200;BA 95 325F;Ceralox APA 0.5;Cristalba CAHPF 240;Dermagrain 900;Dural F 30;Dural HT;Dural HT-F 24;Dural P 120;EB 99;EKF 100;EKF 500;Electrocorundum;F 220;F 240;F 280;F 280 (mineral);F 800;F 800 (mineral);FN 237;ko7;ku10;nk63;RUBY;ku5-3;Abramant F 36;Abramax F 46;Abramax F 54;fn237;Spherical Alumina;Aluminum oxide, pore size 58 ??, ~150 mesh;Aluminum oxide, Type WN-6 Neutral, Activity Grade Super I;Corundum (Al2O3);Aluminum oxide, Puratronic?;NK 63;Aluminum oxide, nanowires, diam. x L 2-6 nm x 200-400 nm;Aluminum oxide, nanofiber, diam. x L <20 nm x 500 mum;gamma-Alumina, 1/16' spheres;KO 7;Aluminum oxide, neutral, HPLC Flash Grade;Aluminum oxide, pellets, 3 mm;MFCD07370730;alpha-Corundum;Aluminum oxide, fused, powder, primarily alpha-phase, -325 mesh;Aluminum oxide, polishing compound, 2oz (57g);Aluminum oxide, nanofiber, diam. x L <20 nm x 100 mum;MP 1 (Refractory);Aluminum oxide, calcined, insulating powder;Aluminum oxide, 5 mum mean particle size;Inhibitor removers, replacement packing for removing hydroquinone and monomethyl ether hydroquinone;Aluminum oxide, powder, ultra dry;Aluminum oxide, catalyst support, low silica;Aluminum oxide, 99.3%, < 325 mesh, d 50 5 - 7 micron;Aluminum oxide, gamma-alpha;Aluminum oxide, for chromatography;Aluminum oxide, nanopowder, <50 nm particle size (TEM);Aluminum oxide, Type WB-5: Basic;Aluminum oxide substrate, 10x10x0.5mm, polished one side, A plane;Alumina;Aluminum oxide, Type WA-4: Acid;Inhibitor removers, Prepacked column for removing hydroquinone and monomethyl ether hydroquinone;MFCD00211795;Aluminum oxide, Type WN-9: Neutral;Emery;oxo(oxoalumanyloxy)alumane;Aluminum oxide (gamma) Powder, 99.97% Nano;Aluminum oxide, powder, primarily alpha phase, <=10 mum avg. part. size, 99.5% trace metals basis;Aluminum oxide, CP;Aluminum oxide, acidic, HPLC Flash Grade;Aluminum oxide, gamma;KU 5-3;Aluminum oxide, Type A-5;Aluminum oxide, SAJ special grade, >=98.0%;Aluminum oxide, Type WN-6, Neutral, Activity Grade Super I;12415-34-8;Alumina, NIST(R) SRM(R) 699, reduction grade;Aluminum Oxide (Activated, Neutral, Brockmann I);Aluminum oxide, alpha-phase;Aluminum oxide, cement;Aluminum oxide, catalyst support;TWNQGVIAIRXVLR-UHFFFAOYSA-N;12174-49-1;Aluminum oxide, Type WA-7: Acid;Aluminum oxide, basic, for TLC, 5-15 Micron APS Powder;Alumina, NIST(R) SRM(R) 742, reference point;KER 710;Aluminum oxide, alpha, catalyst support, low surface area, trimodal;Aluminum oxide 90 acidic;Aluminum oxide, alpha;Sapphire substrate, 50.8mm dia x 0.432mm thick, EPI... |
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